JOURNAL ARTICLE
High aspect ratio micro/nano machining with proton beam writing on aqueous developable – easily stripped negative chemically-amplified resists
Margarita ChatzichristidiE. ValamontesPanagiotis ArgitisI. RaptisJ.A. van KanF. ZhangF. Watt
Year: 2007 Journal: Microelectronic Engineering Vol: 85 (5-6)Pages: 945-948 Publisher: Elsevier BV
Keywords:
Resist Laser linewidth Materials science Photoresist Stripping (fiber) Proton Aspect ratio (aeronautics) Nano- Electroplating Beam (structure) Aqueous solution Machining Nanotechnology Optics Optoelectronics Composite material Chemistry Laser Layer (electronics) Metallurgy Physics
Metrics
6
Cited By
1.24
FWCI (Field Weighted Citation Impact)
18
Refs
0.81
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
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