Strippable aqueous base developable negative photoresist for high aspect ratio micromachining

Margarita Chatzichristidi; I. Raptis; Constantinos D. Diakoumakos; Ν. Γλέζος; Panagiotis Argitis; M. Sanopoulou

doi:10.1016/s0167-9317(02)00481-1

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Strippable aqueous base developable negative photoresist for high aspect ratio micromachining

Margarita Chatzichristidi I. Raptis Constantinos D. Diakoumakos Ν. Γλέζος Panagiotis Argitis M. Sanopoulou

Year: 2002 Journal: Microelectronic Engineering Vol: 61-62 Pages: 729-735 Publisher: Elsevier BV

DOI: 10.1016/s0167-9317(02)00481-1

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Keywords:

Photoresist Surface micromachining Materials science Aqueous solution Developable surface Base (topology) Aspect ratio (aeronautics) Composite material Nanotechnology Chemistry Fabrication Geometry Mathematics

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Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Strippable aqueous base developable negative photoresist for high aspect ratio micromachining

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