Formation of buried oxide layers in titanium by high-fluence oxygen ion implantation

C. Hammerl; Y. Bohne; W. Assmann; K. Helming; B. Rauschenbach

doi:10.1016/s0168-583x(03)00913-3

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Formation of buried oxide layers in titanium by high-fluence oxygen ion implantation

C. Hammerl Y. Bohne W. Assmann K. Helming B. Rauschenbach

Year: 2003 Journal: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Vol: 206 Pages: 1072-1076 Publisher: Elsevier BV

DOI: 10.1016/s0168-583x(03)00913-3

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Keywords:

Titanium Fluence Materials science Oxygen Oxide Ion implantation Ion Titanium oxide Metallurgy Chemical engineering Chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Formation of buried oxide layers in titanium by high-fluence oxygen ion implantation

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