Photo-Assisted Metalorganic Chemical Vapor Deposition of Zinc Oxide Thin Films

Abstract

Zinc oxide thin films were obtained from dimethylzinc and carbon dioxide or oxygen by the metalorganic chemical vapor deposition method. A low-pressure mercury lamp was used to assist the deposition of films. At a substrate temperature above 200°C, c -axis-oriented polycrystalline thin films were obtained. The deposition rate of the thermally grown films strongly depended on the configuration of the reactor, and effects of photo-irradiation on the deposition rate also changed according to the configuration of the reactor. In a horizontal reactor, the deposition rate actually decreased upon irradiation.