JOURNAL ARTICLE

Photo‐assisted chemical vapor deposition of gallium sulfide thin films

Patrick J. PernotAndrew R. Barron

Year: 1995 Journal:   Chemical Vapor Deposition Vol: 1 (3)Pages: 75-78   Publisher: Wiley

Abstract

Polycrystalline films of gallium sulfide may be deposited from [( t Bu)GaS], (see Fig.) by photo‐assisted CVD at temperatures lower than by thermal CVD. It is found that the stoichiometry of the films is dependent on the wavelength window. The films are however found to be of the thermo‐dynamic hexagonal phase rather than the metastable cubic phase produced by thermal CVD. magnified image

Keywords:
Gallium Thin film Chemical vapor deposition Materials science Crystallite Stoichiometry Metastability Deposition (geology) Sulfide Phase (matter) Carbon film Chemical engineering Analytical Chemistry (journal) Nanotechnology Chemistry Metallurgy Physical chemistry Organic chemistry

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14
Cited By
1.76
FWCI (Field Weighted Citation Impact)
11
Refs
0.85
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Chalcogenide Semiconductor Thin Films
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Quantum Dots Synthesis And Properties
Physical Sciences →  Materials Science →  Materials Chemistry
nanoparticles nucleation surface interactions
Physical Sciences →  Earth and Planetary Sciences →  Atmospheric Science

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