Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

María Losurdo; Maria M. Giangregorio; A. Sacchetti; P. Capezzuto; Giovanni Bruno; Graziella Malandrino; Ignazio L. Fragalà

doi:10.1557/jmr.2006.0221

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Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

María Losurdo Maria M. Giangregorio A. Sacchetti P. Capezzuto Giovanni Bruno Graziella Malandrino Ignazio L. Fragalà

Year: 2006 Journal: Journal of materials research/Pratt's guide to venture capital sources Vol: 21 (7)Pages: 1632-1637 Publisher: Springer Nature

DOI: 10.1557/jmr.2006.0221

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Keywords:

Metalorganic vapour phase epitaxy Materials science Chemical vapor deposition Sapphire Thin film Combustion chemical vapor deposition Carbon film Dielectric Chemical engineering Analytical Chemistry (journal) Optoelectronics Nanotechnology Epitaxy Optics Layer (electronics) Laser Organic chemistry Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

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