Oxynitride perovskite LaTiOxNy thin films deposited by reactive sputtering

Claire Le Paven-Thivet; Laurent Le Gendre; J. Le Castrec; François Cheviré; Franck Tessier; J. Pinel

doi:10.1016/j.progsolidstchem.2007.01.012

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Oxynitride perovskite LaTiOxNy thin films deposited by reactive sputtering

Claire Le Paven-Thivet Laurent Le Gendre J. Le Castrec François Cheviré Franck Tessier J. Pinel

Year: 2007 Journal: Progress in Solid State Chemistry Vol: 35 (2-4)Pages: 299-308 Publisher: Elsevier BV

DOI: 10.1016/j.progsolidstchem.2007.01.012

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Keywords:

Materials science Sputtering Amorphous solid Thin film Argon Crystallite Scanning electron microscope Lanthanum Analytical Chemistry (journal) Sputter deposition Substrate (aquarium) Lanthanum oxide Oxide Composite material Inorganic chemistry Nanotechnology Crystallography Metallurgy Chemistry

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Inorganic Chemistry and Materials

Physical Sciences → Chemistry → Inorganic Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Oxynitride perovskite LaTiOxNy thin films deposited by reactive sputtering

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