Perovskite oxynitride LaTiOxNy thin films: Dielectric characterization in low and high frequencies

Yu Lu; Ahmed Ziani; Claire Le Paven-Thivet; Ratiba Benzerga; Laurent Le Gendre; Didier Fasquelle; Hussein Kassem; Franck Tessier; Valérie Vignéras; Jean-Claude Carru; Ala Sharaiha

doi:10.1016/j.tsf.2011.01.226

JOURNAL ARTICLE

Perovskite oxynitride LaTiOxNy thin films: Dielectric characterization in low and high frequencies

Yu Lu Ahmed Ziani Claire Le Paven-Thivet Ratiba Benzerga Laurent Le Gendre Didier Fasquelle Hussein Kassem Franck Tessier Valérie Vignéras Jean-Claude Carru Ala Sharaiha

Year: 2011 Journal: Thin Solid Films Vol: 520 (2)Pages: 778-783 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2011.01.226

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Keywords:

Materials science Dielectric Thin film Sputter deposition Substrate (aquarium) Silicon oxynitride Crystallite Dielectric loss Sputtering High-κ dielectric Silicon Optoelectronics Analytical Chemistry (journal) Nanotechnology Metallurgy Chemistry

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Inorganic Chemistry and Materials

Physical Sciences → Chemistry → Inorganic Chemistry

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

MXene and MAX Phase Materials

Physical Sciences → Materials Science → Materials Chemistry

Perovskite oxynitride LaTiOxNy thin films: Dielectric characterization in low and high frequencies

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