Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering

M. Fenker; H. Kappl; O. Banakh; Nicolas Martin; J.F. Pierson

doi:10.1016/j.surfcoat.2006.08.104

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Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering

M. Fenker H. Kappl O. Banakh Nicolas Martin J.F. Pierson

Year: 2006 Journal: Surface and Coatings Technology Vol: 201 (7)Pages: 4152-4157 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2006.08.104

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Keywords:

Materials science Analytical Chemistry (journal) Niobium Amorphous solid Sputter deposition Sputtering Thin film Pulsed DC Niobium nitride Ellipsometry Scanning electron microscope Chemistry Nitride Crystallography Nanotechnology Metallurgy Composite material

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering

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