JOURNAL ARTICLE

Maskless Lithography Based on DMD

Ke Jun ZhongYi GaoFeng Li

Year: 2013 Journal:   Key engineering materials Vol: 552 Pages: 207-213   Publisher: Trans Tech Publications

Abstract

Largely owing to the high cost of masks for lithography, recently there is a strong interest in maskless lithography. Maskless lithography is a potential program to overcome the high cost caused by rising price of the masks. Because of the advantages of low cost, high flexibility and short production cycle, digital mirror device (DMD)-based maskless lithography has been brought storm attention by people. Both the theory and experiment of DMD-based maskless lithography achieved good results. Maskless lithography systems based on DMD are analyzed in this review. Principles of construction, examples of implication, as well as future development direction are discussed.

Keywords:
Maskless lithography Lithography Computational lithography Next-generation lithography Flexibility (engineering) Materials science Multiple patterning Nanotechnology Extreme ultraviolet lithography Electron-beam lithography Optoelectronics Resist

Metrics

10
Cited By
0.00
FWCI (Field Weighted Citation Impact)
26
Refs
0.04
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Optical Systems and Laser Technology
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Image Enhancement Techniques
Physical Sciences →  Computer Science →  Computer Vision and Pattern Recognition

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