JOURNAL ARTICLE
Maskless lithography
Year: 2005 Journal: Microelectronic Engineering Vol: 78-79 Pages: 381-392 Publisher: Elsevier BV
Keywords:
Maskless lithography Throughput Lithography Photomask Projector Spatial light modulator Computer science Photolithography Projection (relational algebra) Next-generation lithography Materials science Optics Enhanced Data Rates for GSM Evolution Nanotechnology Computational lithography Multiple patterning Optoelectronics Physics Electron-beam lithography Resist Artificial intelligence Telecommunications
Metrics
39
Cited By
3.22
FWCI (Field Weighted Citation Impact)
16
Refs
0.93
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences → Engineering → Biomedical Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences → Materials Science → Surfaces, Coatings and Films
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