JOURNAL ARTICLE

Maskless lithography

R. F. W. Pease

Year: 2005 Journal:   Microelectronic Engineering Vol: 78-79 Pages: 381-392   Publisher: Elsevier BV
Keywords:
Maskless lithography Throughput Lithography Photomask Projector Spatial light modulator Computer science Photolithography Projection (relational algebra) Next-generation lithography Materials science Optics Enhanced Data Rates for GSM Evolution Nanotechnology Computational lithography Multiple patterning Optoelectronics Physics Electron-beam lithography Resist Artificial intelligence Telecommunications

Metrics

39
Cited By
3.22
FWCI (Field Weighted Citation Impact)
16
Refs
0.93
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films

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