Maskless lithography

Rajesh Menon; Amil Patel; Darı́o Gil; Henry I. Smith

doi:10.1016/s1369-7021(05)00699-1

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JOURNAL ARTICLE

Maskless lithography

Rajesh Menon Amil Patel Darı́o Gil Henry I. Smith

Year: 2005 Journal: Materials Today Vol: 8 (2)Pages: 26-33 Publisher: Elsevier BV

DOI: 10.1016/s1369-7021(05)00699-1

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Abstract

The increasingly important role of maskless lithography in industry, research, and emerging applications in nanoscale science and engineering is discussed. The various forms of maskless lithography are reviewed with major emphasis on zone-plate-array lithography, a new paradigm that promises low cost and extendibility to the limits of the lithographic process.

Keywords:

Maskless lithography Lithography Computational lithography Nanotechnology Next-generation lithography Materials science Multiple patterning Photolithography Electron-beam lithography Optoelectronics Resist

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Topics

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Nanowire Synthesis and Applications

Physical Sciences → Engineering → Biomedical Engineering

Maskless lithography

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