JOURNAL ARTICLE

Summary Abstract: Laser-controlled plasma etching

Grace RekstenW. M. HolberRichard M. Osgood

Year: 1984 Journal:   Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Vol: 2 (2)Pages: 506-507   Publisher: American Institute of Physics

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Grace Reksten, W. Holber, R. M. Osgood; Summary Abstract: Laser‐controlled plasma etching. J. Vac. Sci. Technol. A 1 April 1984; 2 (2): 506–507. https://doi.org/10.1116/1.572607 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search

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2
Cited By
0.48
FWCI (Field Weighted Citation Impact)
0
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0.64
Citation Normalized Percentile
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Topics

Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Laser-induced spectroscopy and plasma
Physical Sciences →  Engineering →  Mechanics of Materials

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