JOURNAL ARTICLE
Summary Abstract: Hydrogen plasma etching of semiconductors and their oxides
R. P. H. ChangC. C. ChangS. Darack
Year: 1982 Journal: Journal of Vacuum Science and Technology Vol: 20 (3)Pages: 490-491 Publisher: American Institute of Physics
Abstract
First Page
Keywords:
Etching (microfabrication) Plasma Semiconductor Materials science Hydrogen Plasma etching Nanotechnology Optoelectronics Chemistry Physics Nuclear physics Organic chemistry
Metrics
8
Cited By
0.46
FWCI (Field Weighted Citation Impact)
0
Refs
0.63
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
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