JOURNAL ARTICLE

Summary Abstract: Hydrogen plasma etching of semiconductors and their oxides

R. P. H. ChangC. C. ChangS. Darack

Year: 1982 Journal:   Journal of Vacuum Science and Technology Vol: 20 (3)Pages: 490-491   Publisher: American Institute of Physics

Abstract

First Page

Keywords:
Etching (microfabrication) Plasma Semiconductor Materials science Hydrogen Plasma etching Nanotechnology Optoelectronics Chemistry Physics Nuclear physics Organic chemistry

Metrics

8
Cited By
0.46
FWCI (Field Weighted Citation Impact)
0
Refs
0.63
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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