Sputtering characteristics of diamond and hydrogenated amorphous carbon films by r.f. plasma

Kenji Kobayashi; Kiyoyuki Yamamoto; Nobuki Mutsukura; Yoshio Machi

doi:10.1016/0040-6090(90)90007-z

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Sputtering characteristics of diamond and hydrogenated amorphous carbon films by r.f. plasma

Kenji Kobayashi Kiyoyuki Yamamoto Nobuki Mutsukura Yoshio Machi

Year: 1990 Journal: Thin Solid Films Vol: 185 (1)Pages: 71-78 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(90)90007-z

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Keywords:

Sputtering Carbon film Amorphous solid Hydrogen Analytical Chemistry (journal) Argon Materials science Amorphous carbon Diamond Chemical vapor deposition Diamond-like carbon Carbon fibers Torr Scanning electron microscope Thin film Chemistry Crystallography Nanotechnology Composite material Composite number Organic chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Sputtering characteristics of diamond and hydrogenated amorphous carbon films by r.f. plasma

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