Ionic properties of ultrathin yttria-stabilized zirconia thin films fabricated by atomic layer deposition with water, oxygen, and ozone

Ho Keun Kim; Dong Young Jang; Jun‐Woo Kim; Kiho Bae; Joon Hyung Shim

doi:10.1016/j.tsf.2015.05.063

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Ionic properties of ultrathin yttria-stabilized zirconia thin films fabricated by atomic layer deposition with water, oxygen, and ozone

Ho Keun Kim Dong Young Jang Jun‐Woo Kim Kiho Bae Joon Hyung Shim

Year: 2015 Journal: Thin Solid Films Vol: 589 Pages: 441-445 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2015.05.063

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Keywords:

Yttria-stabilized zirconia X-ray photoelectron spectroscopy Atomic layer deposition Materials science Thin film Cubic zirconia Analytical Chemistry (journal) Dielectric spectroscopy Ionic conductivity Conductivity Chemical engineering Inorganic chemistry Chemistry Nanotechnology Ceramic Composite material Physical chemistry Electrode Electrochemistry Organic chemistry

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Advancements in Solid Oxide Fuel Cells

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ionic properties of ultrathin yttria-stabilized zirconia thin films fabricated by atomic layer deposition with water, oxygen, and ozone

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