Oxide ion conduction of yttria-stabilized zirconia films deposited by atomic layer deposition

Cheng‐Chieh Chao; Hong Huang; Joon Seok Park; Fritz B. Prinz

doi:10.1557/proc-1098-hh03-18

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Oxide ion conduction of yttria-stabilized zirconia films deposited by atomic layer deposition

Cheng‐Chieh Chao Hong Huang Joon Seok Park Fritz B. Prinz

Year: 2008 Journal: MRS Proceedings Vol: 1098 Publisher: Cambridge University Press

DOI: 10.1557/proc-1098-hh03-18

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Keywords:

Materials science Yttria-stabilized zirconia Atomic layer deposition Thin film Oxide Cubic zirconia Conductivity Layer (electronics) Ohmic contact Electrolyte Nanotechnology Composite material Electrode Metallurgy Ceramic

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Advancements in Solid Oxide Fuel Cells

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Fuel Cells and Related Materials

Physical Sciences → Engineering → Electrical and Electronic Engineering

Oxide ion conduction of yttria-stabilized zirconia films deposited by atomic layer deposition

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