JOURNAL ARTICLE

CMOS compatibility and excellent resistive switching of tantalum oxide-based resistive switching memory

Liping FuG.W. PanRui HaoXiaolong FanYingtao Li

Year: 2025 Journal:   Chinese Physics B Vol: 34 (7)Pages: 077201-077201   Publisher: IOP Publishing

Abstract

Abstract A CMOS compatible RRAM device with TaN/Ta/TaO x /TaN structure was proposed for nonvolatile memory applications. Excellent resistive switching characteristics, including low operation voltages (< 1 V), low operation current (< 100 μA), good programming/erasing endurance (> 10 6 cycles), satisfactory uniformity, and reliable data retention, have been demonstrated. Furthermore, all of the elements in the fabricated TaN/Ta/TaO x /TaN devices are highly compatible with modern CMOS manufacturing process, showing promising application in the next generation of nonvolatile memory.

Keywords:
Materials science Resistive random-access memory Compatibility (geochemistry) Tantalum Optoelectronics Resistive touchscreen CMOS Oxide Electrical engineering Composite material Voltage Metallurgy Engineering

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Topics

Advanced Memory and Neural Computing
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Transition Metal Oxide Nanomaterials
Physical Sciences →  Materials Science →  Polymers and Plastics
Electronic and Structural Properties of Oxides
Physical Sciences →  Materials Science →  Materials Chemistry
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