Liping FuG.W. PanRui HaoXiaolong FanYingtao Li
Abstract A CMOS compatible RRAM device with TaN/Ta/TaO x /TaN structure was proposed for nonvolatile memory applications. Excellent resistive switching characteristics, including low operation voltages (< 1 V), low operation current (< 100 μA), good programming/erasing endurance (> 10 6 cycles), satisfactory uniformity, and reliable data retention, have been demonstrated. Furthermore, all of the elements in the fabricated TaN/Ta/TaO x /TaN devices are highly compatible with modern CMOS manufacturing process, showing promising application in the next generation of nonvolatile memory.
Yuchao YangPatrick SheridanWei Lu
Shimeng YuByoungil LeeH.‐S. Philip Wong
Xinjun LiuSharif SadafSangsu ParkSeonghyun KimEuijun ChaDaeseok LeeGun Young JungHyunsang Hwang
Andrea ZafforaDeok‐Yong ChoKug‐Seung LeeF. Di QuartoRainer WaserMonica SantamariaIlia Valov
Seok Man HongHee-Dong KimHo-Myoung AnTae Geun Kim