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JOURNAL ARTICLE

Challenges and solutions in Mist-CVD of Ga2O3 heteroepitaxial films

Roman Yatskiv Roman Yatskiv Ondřej Černohorský Nikola Bašinová Jan Grym A.A. Korchovyi Alexey Nazarov J. Maixner

Year: 2024 Journal: Materials Science in Semiconductor Processing Vol: 186 Pages: 109063-109063 Publisher: Elsevier BV

DOI: 10.1016/j.mssp.2024.109063

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Keywords:

Mist Materials science Chemical vapor deposition Engineering physics Nanotechnology Meteorology Engineering

Metrics

6

Cited By

1.28

FWCI (Field Weighted Citation Impact)

30

Refs

0.69

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

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