Wafer-Scale Fabrication of Quantum Photonic Devices in Silicon Carbide

Sridhar Majety; Pranta Saha; Marina Radulaski

doi:10.1364/fio.2023.jtu5a.40

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JOURNAL ARTICLE

Wafer-Scale Fabrication of Quantum Photonic Devices in Silicon Carbide

Sridhar Majety Pranta Saha Marina Radulaski

Year: 2023 Pages: JTu5A.40-JTu5A.40

DOI: 10.1364/fio.2023.jtu5a.40

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Abstract

We develop a wafer-scale process for nanofabrication of color center photonic devices in an arbitrary silicon carbide substrate using a reactive ion beam etching approach with a rotating tilted wafer.

Keywords:

Wafer Etching (microfabrication) Silicon carbide Materials science Fabrication Nanolithography Optoelectronics Reactive-ion etching Photonics Substrate (aquarium) Silicon Hybrid silicon laser Wafer fabrication Silicon photonics Nanotechnology

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Nanowire Synthesis and Applications

Physical Sciences → Engineering → Biomedical Engineering

Wafer-Scale Fabrication of Quantum Photonic Devices in Silicon Carbide

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