Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

Saı̈d Agouram

doi:10.1016/s0257-8972(03)01184-8

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Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

Saı̈d Agouram

Year: 2004 Journal: Surface and Coatings Technology Vol: 180-181 Pages: 164-168 Publisher: Elsevier BV

DOI: 10.1016/s0257-8972(03)01184-8

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Keywords:

Materials science Chromium Stoichiometry Analytical Chemistry (journal) X-ray photoelectron spectroscopy Sputter deposition Sputtering Thin film Cavity magnetron Chromium nitride Metallurgy Nitride Chemical engineering Composite material Physical chemistry Nanotechnology Chemistry Layer (electronics)

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

MXene and MAX Phase Materials

Physical Sciences → Materials Science → Materials Chemistry

Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air

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