JOURNAL ARTICLE

Mask optimization in proximity lithography of thick resist

何骏 He Jun刘世杰 Liu ShijieBin Wang郭猛 Guo Meng王岳亮 Wang Yueliang

Year: 2015 Journal:   High Power Laser and Particle Beams Vol: 27 (7)Pages: 74104-74104   Publisher: Shanghai Institute of Optics and Fine Mechanics
Keywords:
Resist Lithography Materials science Extreme ultraviolet lithography Nanotechnology Optoelectronics

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Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering

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