JOURNAL ARTICLE
Mask optimization in proximity lithography of thick resist
何骏 He Jun刘世杰 Liu ShijieBin Wang郭猛 Guo Meng王岳亮 Wang Yueliang
Year: 2015 Journal: High Power Laser and Particle Beams Vol: 27 (7)Pages: 74104-74104 Publisher: Shanghai Institute of Optics and Fine Mechanics
Keywords:
Resist Lithography Materials science Extreme ultraviolet lithography Nanotechnology Optoelectronics
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Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences → Engineering → Biomedical Engineering
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
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