JOURNAL ARTICLE
Lithographic process window optimization for mask aligner proximity lithography
Reinhard VoelkelUwe VoglerArianna BramatiAndreas ErdmannNezih ÜnalUlrich HofmannMarc HennemeyerRalph ZoberbierDavid NguyenJuergen Brügger
Year: 2014 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 9052 Pages: 90520G-90520G Publisher: SPIE
Abstract
Paper 90520G, 11 S.
Keywords:
Lithography Process window Photolithography Resist Optics Photoresist Wafer Immersion lithography Optical proximity correction Next-generation lithography Window (computing) X-ray lithography Computer science Materials science Extreme ultraviolet lithography Process (computing) Optoelectronics Physics Electron-beam lithography Nanotechnology Layer (electronics)
Metrics
3
Cited By
0.18
FWCI (Field Weighted Citation Impact)
13
Refs
0.62
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
Advanced optical system design
Physical Sciences → Engineering → Biomedical Engineering
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