Mask aligner lithography simulation – From lithography simulation to process validation

Kristian Motzek; Stefan Partel; Arianna Bramati; Ulrich Hofmann; Nezih Ünal; Marc Hennemeyer; Michael Hornung; A. Heindl; M. Ruhland; Andreas Erdmann; P. Hudek

doi:10.1016/j.mee.2012.07.076

JOURNAL ARTICLE

Mask aligner lithography simulation – From lithography simulation to process validation

Kristian Motzek Stefan Partel Arianna Bramati Ulrich Hofmann Nezih Ünal Marc Hennemeyer Michael Hornung A. Heindl M. Ruhland Andreas Erdmann P. Hudek

Year: 2012 Journal: Microelectronic Engineering Vol: 98 Pages: 121-124 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2012.07.076

Get Full-Text PDF Get Analytical Report

Keywords:

Photoresist Lithography Photolithography X-ray lithography Materials science Computational lithography Process (computing) Next-generation lithography Resist Computer science Maskless lithography Nanotechnology Optics Optoelectronics Electron-beam lithography Physics

Metrics

Cited By

1.09

FWCI (Field Weighted Citation Impact)

Refs

0.82

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Industrial Vision Systems and Defect Detection

Physical Sciences → Engineering → Industrial and Manufacturing Engineering

Advanced Measurement and Metrology Techniques

Physical Sciences → Engineering → Mechanical Engineering

Mask aligner lithography simulation – From lithography simulation to process validation

Metrics

Citation History

Topics

Related Documents

Simulation tools for advanced mask aligner lithography

Advanced mask aligner lithography (AMALITH)

Advanced mask aligner lithography (AMALITH)

Advanced Mask Aligner Lithography (AMALITH)

Lithographic process window optimization for mask aligner proximity lithography