Simulation tools for advanced mask aligner lithography

Arianna Bramati; Uwe Vogler; Bálint Meliorisz; Kristian Motzek; Michael Hornung; Reinhard Voelkel

doi:10.1117/12.897572

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Simulation tools for advanced mask aligner lithography

Arianna Bramati Uwe Vogler Bálint Meliorisz Kristian Motzek Michael Hornung Reinhard Voelkel

Year: 2011 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 8167 Pages: 81670U-81670U Publisher: SPIE

DOI: 10.1117/12.897572

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Abstract

Paper 81670U

Keywords:

Photomask Photolithography Lithography Computational lithography Optical proximity correction Optics Reticle Photoresist Resist Shadow mask Next-generation lithography Computer science Multiple patterning Software Extreme ultraviolet lithography Maskless lithography X-ray lithography Materials science Optoelectronics Electron-beam lithography Physics Wafer Nanotechnology

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Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced optical system design

Physical Sciences → Engineering → Biomedical Engineering

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Simulation tools for advanced mask aligner lithography

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