JOURNAL ARTICLE

Simulation tools for advanced mask aligner lithography

Arianna BramatiUwe VoglerBálint MelioriszKristian MotzekMichael HornungReinhard Voelkel

Year: 2011 Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 8167 Pages: 81670U-81670U   Publisher: SPIE

Abstract

Paper 81670U

Keywords:
Photomask Photolithography Lithography Computational lithography Optical proximity correction Optics Reticle Photoresist Resist Shadow mask Next-generation lithography Computer science Multiple patterning Software Extreme ultraviolet lithography Maskless lithography X-ray lithography Materials science Optoelectronics Electron-beam lithography Physics Wafer Nanotechnology

Metrics

7
Cited By
0.00
FWCI (Field Weighted Citation Impact)
8
Refs
0.10
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced optical system design
Physical Sciences →  Engineering →  Biomedical Engineering
Optical Coatings and Gratings
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films

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