X-Ray Studies of Chromium Nitride (CrxNy) Thin Films Deposited by Reactive Magnetron Sputtering

M. Charbonnier; M. Romand; A. Roche; J.P. Terrat

doi:10.1007/978-1-4615-3460-0_17

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X-Ray Studies of Chromium Nitride (CrxNy) Thin Films Deposited by Reactive Magnetron Sputtering

M. Charbonnier M. Romand A. Roche J.P. Terrat

Year: 1992 Advances in X-ray Analysis Pages: 819-827 Publisher: International Centre for Diffraction Data

DOI: 10.1007/978-1-4615-3460-0_17

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Keywords:

Chromium nitride Materials science High-power impulse magnetron sputtering Chromium Sputtering Sputter deposition Nitride Metallurgy Thin film Optoelectronics Composite material Nanotechnology Layer (electronics)

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Boron and Carbon Nanomaterials Research

Physical Sciences → Materials Science → Materials Chemistry

X-Ray Studies of Chromium Nitride (CrxNy) Thin Films Deposited by Reactive Magnetron Sputtering

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