JOURNAL ARTICLE
X-Ray Studies of Chromium Nitride (CrxNy) Thin Films Deposited by Reactive Magnetron Sputtering
M. CharbonnierM. RomandA. RocheJ.P. Terrat
Year: 1991 Journal: Advances in X-ray Analysis Vol: 35 (B)Pages: 819-827 Publisher: International Centre for Diffraction Data
Abstract
Abstract Chromium nitride hard coatings have been prepared by a plasma process by varying nitrogen partial pressure. The crystallographic structure of these samples has been investigated by XRD and their chemical composition and stoichiometry by Low Energy Electron Induced x-ray Spectrometry (LEEIXS).
Keywords:
Chromium nitride Chromium Stoichiometry Nitride Materials science Thin film Sputtering Analytical Chemistry (journal) Sputter deposition X-ray photoelectron spectroscopy Nitrogen Cavity magnetron X-ray Metallurgy Chemical engineering Chemistry Physical chemistry Nanotechnology Layer (electronics) Optics
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5
Cited By
0.00
FWCI (Field Weighted Citation Impact)
12
Refs
0.37
Citation Normalized Percentile
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Topics
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences → Materials Science → Materials Chemistry
Ion-surface interactions and analysis
Physical Sciences → Engineering → Computational Mechanics
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