JOURNAL ARTICLE
The effect of residual solvent on the profiles of thick positive DNO-photoresist for Microsystem Technologies
Joachim SchulzT. MonoSheng-Hsuan ChungJ. Mohr
Year: 1996 Journal: Microsystem Technologies Vol: 2 (2)Pages: 50-55 Publisher: Springer Science+Business Media
Keywords:
Resist Photoresist Dissolution Lithography Materials science Nanotechnology Optics Chemistry Optoelectronics Layer (electronics) Physics
Metrics
3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
16
Refs
0.45
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Electrowetting and Microfluidic Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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