JOURNAL ARTICLE

The effect of residual solvent on the profiles of thick positive DNO-photoresist for Microsystem Technologies

Joachim SchulzT. MonoSheng-Hsuan ChungJ. Mohr

Year: 1996 Journal:   Microsystem Technologies Vol: 2 (2)Pages: 50-55   Publisher: Springer Science+Business Media
Keywords:
Resist Photoresist Dissolution Lithography Materials science Nanotechnology Optics Chemistry Optoelectronics Layer (electronics) Physics

Metrics

3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
16
Refs
0.45
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Electrowetting and Microfluidic Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

Related Documents

JOURNAL ARTICLE

Novel positive-tone thick photoresist for high aspect ratio microsystem technology

Gen-Wen HsiehYu‐Hung HsiehChii-Rong YangY.-D. Lee

Journal:   Microsystem Technologies Year: 2002 Vol: 8 (4-5)Pages: 326-329
JOURNAL ARTICLE

Solvent content of thick photoresist films

Octavia P. LeharJohn P. SaganLizhong ZhangRalph R. Dammel

Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Year: 2000 Vol: 3999 Pages: 442-442
© 2026 ScienceGate Book Chapters — All rights reserved.