JOURNAL ARTICLE
A novel thick photoresist for microsystem technology
Ph. NiedermannH. BerthouS. ZwicklUrs P. SchönholzerK. U. MeierCh. GantnerD. Kapp-Schwoerer
Year: 2003 Journal: Microelectronic Engineering Vol: 67-68 Pages: 259-265 Publisher: Elsevier BV
Keywords:
Resist Photoresist Electroforming Materials science LIGA Fabrication FOIL method Composite material Microsystem Optics Nanotechnology Optoelectronics Layer (electronics)
Metrics
12
Cited By
0.63
FWCI (Field Weighted Citation Impact)
2
Refs
0.72
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences → Engineering → Biomedical Engineering
Advanced Machining and Optimization Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
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