JOURNAL ARTICLE

A novel thick photoresist for microsystem technology

Keywords:
Resist Photoresist Electroforming Materials science LIGA Fabrication FOIL method Composite material Microsystem Optics Nanotechnology Optoelectronics Layer (electronics)

Metrics

12
Cited By
0.63
FWCI (Field Weighted Citation Impact)
2
Refs
0.72
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advanced Machining and Optimization Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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