JOURNAL ARTICLE
Novel positive-tone thick photoresist for high aspect ratio microsystem technology
Gen-Wen HsiehYu‐Hung HsiehChii-Rong YangY.-D. Lee
Year: 2002 Journal: Microsystem Technologies Vol: 8 (4-5)Pages: 326-329 Publisher: Springer Science+Business Media
Keywords:
Photoresist LIGA Materials science Aspect ratio (aeronautics) Microsystem Microstructure Polymethyl methacrylate Resist Optoelectronics Composite material Fabrication Nanotechnology Polymer Layer (electronics)
Metrics
5
Cited By
0.63
FWCI (Field Weighted Citation Impact)
0
Refs
0.68
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences → Engineering → Biomedical Engineering
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