PECVD of hydrogenated diamond-like carbon films from CH4–Ar mixtures: growth chemistry and material characteristics

G. Cicala

doi:10.1016/s0925-9635(03)00448-5

ScienceGate Book Chapters

JOURNAL ARTICLE

PECVD of hydrogenated diamond-like carbon films from CH4–Ar mixtures: growth chemistry and material characteristics

G. Cicala

Year: 2003 Journal: Diamond and Related Materials Publisher: Elsevier BV

DOI: 10.1016/s0925-9635(03)00448-5

Get Full-Text PDF Get Analytical Report

Keywords:

Plasma-enhanced chemical vapor deposition Sputtering Carbon fibers Etching (microfabrication) Diamond-like carbon Analytical Chemistry (journal) Carbon film Diamond Growth rate Biasing Deposition (geology) Sputter deposition Chemistry Chemical vapor deposition Materials science Thin film Chemical engineering Nanotechnology Voltage Composite material Environmental chemistry

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.39

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

PECVD of hydrogenated diamond-like carbon films from CH4–Ar mixtures: growth chemistry and material characteristics

Metrics

Topics

Related Documents

PECVD of hydrogenated diamond-like carbon films from CH4–Ar mixtures: growth chemistry and material characteristics

Plasma deposition of hydrogenated diamond-like carbon films from CH4-Ar mixtures

Plasma deposition of hydrogenated diamond-like carbon films from CH4-Ar mixtures

Gaseous precursors of diamond-like carbon films in CH4/Ar plasmas

Study on the Hydrogenated Diamond-Like Carbon Films Synthesized by RF-PECVD from n-decane