JOURNAL ARTICLE
Formation of buried insulating layers by high dose oxygen implantation under controlled temperature conditions
Year: 1987 Journal: Microelectronics Reliability Vol: 27 (1)Pages: 191-191 Publisher: Elsevier BV
Keywords:
Materials science Oxygen Composite material Chemistry
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Topics
High voltage insulation and dielectric phenomena
Physical Sciences → Materials Science → Materials Chemistry
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
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