Towards metal gate/high-k dielectric integration for high performance CMOS technology

E. Cartier

doi:10.7567/ssdm.2006.j-1-1

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Towards metal gate/high-k dielectric integration for high performance CMOS technology

E. Cartier

Year: 2006

DOI: 10.7567/ssdm.2006.j-1-1

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Keywords:

Materials science CMOS Dielectric High-κ dielectric Metal gate Optoelectronics Gate dielectric Metal Engineering physics Electronic engineering Electrical engineering Gate oxide Metallurgy Transistor Voltage Engineering

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

3D IC and TSV technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Towards metal gate/high-k dielectric integration for high performance CMOS technology

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Towards metal gate/high-k dielectric integration for high performance CMOS technology

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