JOURNAL ARTICLE

Fabrication of high-aspect-ratio microstructures using SU8 photoresist

LiuG.TianY.KanY.

Year: 2005 Journal:   Microsystem Technologies   Publisher: Springer Science+Business Media
Keywords:
Photoresist Fabrication Microstructure Materials science Aspect ratio (aeronautics) Nanotechnology Composite material

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0.45
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Topics

Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Additive Manufacturing and 3D Printing Technologies
Physical Sciences →  Engineering →  Automotive Engineering
3D IC and TSV technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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