JOURNAL ARTICLE

Fabrication of high-aspect-ratio microstructures using SU8 photoresist

G. LiuY. TianYongchun Kan

Year: 2005 Journal:   Microsystem Technologies Vol: 11 (4-5)Pages: 343-346   Publisher: Springer Science+Business Media
Keywords:
Photoresist Fabrication Microstructure Aspect ratio (aeronautics) Materials science Laser linewidth Surface-area-to-volume ratio Composite material Process (computing) Diffusion Chemical engineering Optics Computer science Engineering

Metrics

50
Cited By
2.90
FWCI (Field Weighted Citation Impact)
3
Refs
0.91
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering

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