Determination of the oxygen content in amorphous SiOx thin films

A. O. Zamchiy; Е. А. Баранов; I. E. Merkulova; Sergey Khmel; E. A. Maximovskiy

doi:10.1016/j.jnoncrysol.2019.05.015

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Determination of the oxygen content in amorphous SiOx thin films

A. O. Zamchiy Е. А. Баранов I. E. Merkulova Sergey Khmel E. A. Maximovskiy

Year: 2019 Journal: Journal of Non-Crystalline Solids Vol: 518 Pages: 43-50 Publisher: Elsevier BV

DOI: 10.1016/j.jnoncrysol.2019.05.015

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Keywords:

Suboxide Analytical Chemistry (journal) Infrared spectroscopy Amorphous solid Materials science Amorphous silicon Silicon Spectroscopy Fourier transform infrared spectroscopy Chemical vapor deposition Thin film Chemistry Crystallography Crystalline silicon Optics Nanotechnology Optoelectronics

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Glass properties and applications

Physical Sciences → Materials Science → Ceramics and Composites

Determination of the oxygen content in amorphous SiOx thin films

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