Structure Study of Amorphous SiOx Films

Lixin Yi; Shenwei Wang; Yang Wang; Chunjun Liang; S. H. Huang; Yufan Du; Yang Wu

doi:10.1109/inow.2007.4302918

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JOURNAL ARTICLE

Structure Study of Amorphous SiOx Films

Lixin Yi Shenwei Wang Yang Wang Chunjun Liang S. H. Huang Yufan Du Yang Wu

Year: 2007 Pages: 134-135

DOI: 10.1109/inow.2007.4302918

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Abstract

Two FTIR spectra bands of amorphous SiO _x films prepared by sputtering technology were detected. Different structures corresponding to them were studied according to the CFM mode and RBM mode.

Keywords:

Amorphous solid Sputtering Fourier transform infrared spectroscopy Materials science Mode (computer interface) Spectral line Analytical Chemistry (journal) Optoelectronics Crystallography Chemistry Physics Nanotechnology Computer science Optics Thin film Organic chemistry

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Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Structure Study of Amorphous SiOx Films

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