Micron-sized fracture experiments on amorphous SiOx films and SiOx/SiNx multi-layers

Kurt Matoy; Helmut Schönherr; Thomas Detzel; Gerhard Dehm

doi:10.1016/j.tsf.2010.05.114

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Micron-sized fracture experiments on amorphous SiOx films and SiOx/SiNx multi-layers

Kurt Matoy Helmut Schönherr Thomas Detzel Gerhard Dehm

Year: 2010 Journal: Thin Solid Films Vol: 518 (20)Pages: 5796-5801 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2010.05.114

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Keywords:

Materials science Fracture toughness Composite material Silicon nitride Cantilever Layer (electronics) Bending Brittleness Focused ion beam Stress (linguistics) Ultimate tensile strength Silicon oxide Fracture (geology) Silicon Amorphous solid Optoelectronics Ion Chemistry Crystallography

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Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Micron-sized fracture experiments on amorphous SiOx films and SiOx/SiNx multi-layers

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