Alkanethiol self-assembled monolayer on copper polycrystalline thin films: Influence on resistivity

Marcos Flores; Sebastián Donoso; Magdalena Ortiz; Gabriela Acosta; Henry A. Fernández

doi:10.1016/j.matchemphys.2018.01.034

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Alkanethiol self-assembled monolayer on copper polycrystalline thin films: Influence on resistivity

Marcos Flores Sebastián Donoso Magdalena Ortiz Gabriela Acosta Henry A. Fernández

Year: 2018 Journal: Materials Chemistry and Physics Vol: 208 Pages: 97-102 Publisher: Elsevier BV

DOI: 10.1016/j.matchemphys.2018.01.034

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Keywords:

Electrical resistivity and conductivity Monolayer Materials science Copper Crystallite Mica X-ray photoelectron spectroscopy Thin film Surface roughness Self-assembled monolayer Chemical vapor deposition Chemical engineering Analytical Chemistry (journal) Composite material Nanotechnology Metallurgy Chemistry Organic chemistry

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Molecular Junctions and Nanostructures

Physical Sciences → Engineering → Electrical and Electronic Engineering

Polymer Surface Interaction Studies

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Electrodeposition and Electroless Coatings

Physical Sciences → Engineering → Electrical and Electronic Engineering

Alkanethiol self-assembled monolayer on copper polycrystalline thin films: Influence on resistivity

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