Corrosion Protection of Copper by a Self‐Assembled Monolayer of Alkanethiol

Abstract

A self‐assembled monolayer of 1‐dodecanethiol (DT) was formed on a copper surface pretreated using different methods. The corrosion protection abilities of the monolayer were evaluated in an air‐saturated 0.51 M NaCl solution using various techniques including electrochemical impedance spectroscopy, polarization, coulometry, weight loss, and x‐ray photoelectron spectroscopy. It was found that the corrosion resistance of the monolayer was improved markedly by using a nitric acid etching method. A minimum concentration of M DT was needed to form a protective monolayer. The DT‐monolayer retarded the reduction of dissolved oxygen and inhibited the growth of copper oxide in the NaCl solution. In comparison with other inhibitors, such as benzotriazole (BTA) and mercapto‐benzothiazole (MBT), the DT‐monolayer showed much better corrosion resistance in aqueous solution.