Influence of Self-Assembled Organic Thin Film Monolayer on Ambient Copper Surfaces Oxidation

Ilia Platzman; Hossam Haick; Rina Tannenbaum

doi:10.1557/proc-1029-f03-08

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Influence of Self-Assembled Organic Thin Film Monolayer on Ambient Copper Surfaces Oxidation

Ilia Platzman Hossam Haick Rina Tannenbaum

Year: 2007 Journal: MRS Proceedings Vol: 1029 Publisher: Cambridge University Press

DOI: 10.1557/proc-1029-f03-08

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Keywords:

Materials science X-ray photoelectron spectroscopy Monolayer Oxide Copper Thin film Chemical engineering Transmission electron microscopy Crystallite Copper oxide Adsorption Thermal oxidation Layer (electronics) Evaporation Self-assembled monolayer Nanotechnology Organic chemistry Metallurgy Chemistry

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Molecular Junctions and Nanostructures

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Influence of Self-Assembled Organic Thin Film Monolayer on Ambient Copper Surfaces Oxidation

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