Room Temperature Deposited Transparent Conducting InZnO:Ga thin films by Non-Reactive RF-Magnetron Sputtering

Himadri Sekhar Das; Arka Dey; Partha Pratim Ray; Rajesh Das

doi:10.1016/j.matpr.2017.10.070

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Room Temperature Deposited Transparent Conducting InZnO:Ga thin films by Non-Reactive RF-Magnetron Sputtering

Himadri Sekhar Das Arka Dey Partha Pratim Ray Rajesh Das

Year: 2017 Journal: Materials Today Proceedings Vol: 4 (14)Pages: 12610-12614 Publisher: Elsevier BV

DOI: 10.1016/j.matpr.2017.10.070

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Keywords:

Materials science Sputtering Optoelectronics Sheet resistance Amorphous solid Transmittance Substrate (aquarium) Thin film Sputter deposition Surface roughness Figure of merit Electrical resistivity and conductivity Ceramic Composite material Layer (electronics) Nanotechnology Electrical engineering

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Room Temperature Deposited Transparent Conducting InZnO:Ga thin films by Non-Reactive RF-Magnetron Sputtering

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