Preparation and properties of Mg0.2Zn0.8O:Al UV transparent conducting thin films deposited by RF magnetron sputtering at room temperature with rapid annealing

Hua Wang; Zhu Huang; Jiwen Xu; Ling Yang; Shangju Zhou

doi:10.1007/s10854-011-0465-z

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Preparation and properties of Mg0.2Zn0.8O:Al UV transparent conducting thin films deposited by RF magnetron sputtering at room temperature with rapid annealing

Hua Wang Zhu Huang Jiwen Xu Ling Yang Shangju Zhou

Year: 2011 Journal: Journal of Materials Science Materials in Electronics Vol: 23 (2)Pages: 403-407 Publisher: Springer Science+Business Media

DOI: 10.1007/s10854-011-0465-z

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Keywords:

Materials science Sputtering Annealing (glass) Thin film Argon Sputter deposition Crystallinity Transmittance Electrical resistivity and conductivity Optoelectronics Analytical Chemistry (journal) Composite material Nanotechnology Chemistry Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Preparation and properties of Mg0.2Zn0.8O:Al UV transparent conducting thin films deposited by RF magnetron sputtering at room temperature with rapid annealing

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