The properties of Co-doped copper nitride films deposited by reactive magnetron co-sputtering

Abstract

Co-doped copper nitride films were successfully prepared on various substrates by reactive magnetron co-sputtering. We study the surface chemicals, structures, electrical resistivity, optical transmittance and magnetic properties of Co-doped Cu3N films. X-ray diffraction patterns show that the Co-doped films more readily exhibit diffraction peaks on different orientations when deposited on ITO glass substrates. The resistivity of the films significantly decreases from 5730 Ω·cm to 225 Ω·cm with increasing content of Co. Vibrating sample magnetometer tests show that magnetic films were obtained via Co doping.