JOURNAL ARTICLE

Copper nitride films deposited by dc reactive magnetron sputtering

K. Venkata Subba ReddyA. Sivasankar ReddyP. Sreedhara ReddyS. Uthanna

Year: 2007 Journal:   Journal of Materials Science Materials in Electronics Vol: 18 (10)Pages: 1003-1008   Publisher: Springer Science+Business Media
Keywords:
Materials science Substrate (aquarium) Sputtering Crystallite Copper Sputter deposition Electrical resistivity and conductivity Nitride Indentation hardness Analytical Chemistry (journal) Thin film Metallurgy Composite material Microstructure Layer (electronics) Chemistry Nanotechnology Electrical engineering

Metrics

37
Cited By
1.07
FWCI (Field Weighted Citation Impact)
38
Refs
0.75
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
Copper-based nanomaterials and applications
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

Related Documents

JOURNAL ARTICLE

Addition of silver in copper nitride films deposited by reactive magnetron sputtering

J.F. PiersonDavid Horwat

Journal:   Scripta Materialia Year: 2008 Vol: 58 (7)Pages: 568-570
JOURNAL ARTICLE

Copper sulfide films deposited by cylindrical magnetron reactive sputtering

A.D. JonathWilliam W. AndersonJohn A. ThorntonD. G. Cornog

Journal:   Journal of Vacuum Science and Technology Year: 1979 Vol: 16 (2)Pages: 200-203
JOURNAL ARTICLE

Copper sulfide films deposited by cylindrical magnetron reactive sputtering

Journal:   Vacuum Year: 1980 Vol: 30 (8-9)Pages: 347-348
© 2026 ScienceGate Book Chapters — All rights reserved.