Lithium storage performance of copper nitride films deposited by reactive DC magnetron sputtering

Suchat Suwannatus; Boonchai Duangsawat; Udomdej Pakdee

doi:10.1016/j.matpr.2018.04.084

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Lithium storage performance of copper nitride films deposited by reactive DC magnetron sputtering

Suchat Suwannatus Boonchai Duangsawat Udomdej Pakdee

Year: 2018 Journal: Materials Today Proceedings Vol: 5 (7)Pages: 15208-15212 Publisher: Elsevier BV

DOI: 10.1016/j.matpr.2018.04.084

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Keywords:

Sputtering Copper Nitride Electrolyte Sputter deposition Materials science Lithium (medication) Argon FOIL method Thin film Analytical Chemistry (journal) Chemistry Metallurgy Electrode Composite material Nanotechnology Layer (electronics) Chromatography

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Battery Materials

Physical Sciences → Engineering → Electrical and Electronic Engineering

Lithium storage performance of copper nitride films deposited by reactive DC magnetron sputtering

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