Rapid fabrication of electrohydrodynamic micro-/nanostructures with high aspect ratio using a leaky dielectric photoresist

Guowei Lv; Shihu Zhang; Jinyou Shao; Guolong Wang; Hongmiao Tian; Demei Yu

doi:10.1016/j.reactfunctpolym.2017.06.014

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Rapid fabrication of electrohydrodynamic micro-/nanostructures with high aspect ratio using a leaky dielectric photoresist

Guowei Lv Shihu Zhang Jinyou Shao Guolong Wang Hongmiao Tian Demei Yu

Year: 2017 Journal: Reactive and Functional Polymers Vol: 118 Pages: 1-9 Publisher: Elsevier BV

DOI: 10.1016/j.reactfunctpolym.2017.06.014

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Keywords:

Materials science Photoresist Electrohydrodynamics Dielectric Fabrication Electrowetting Wetting Nanotechnology Contact angle Resist Surface tension Composite material Coalescence (physics) Optoelectronics Electric field

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Electrowetting and Microfluidic Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Fluid Dynamics and Thin Films

Physical Sciences → Engineering → Computational Mechanics

Electrohydrodynamics and Fluid Dynamics

Physical Sciences → Engineering → Electrical and Electronic Engineering

Rapid fabrication of electrohydrodynamic micro-/nanostructures with high aspect ratio using a leaky dielectric photoresist

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