JOURNAL ARTICLE
Buried Oxide and Silicide Formation by High-Dose Implantation in Silicon
Year: 1992 Journal: MRS Bulletin Vol: 17 (6)Pages: 40-46 Publisher: Springer Nature
Keywords:
Ion implantation Silicide Materials science Silicon Doping Oxide Ion Optoelectronics Ion beam Semiconductor Substrate (aquarium) Engineering physics Nanotechnology Chemistry Physics Metallurgy
Metrics
18
Cited By
4.40
FWCI (Field Weighted Citation Impact)
39
Refs
0.95
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Ion-surface interactions and analysis
Physical Sciences → Engineering → Computational Mechanics
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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