BOOK-CHAPTER
Formation of buried iron–cobalt–silicide layers by high dose implantation
D. PankninE. WieserW. SkorupaH. VöhseJ. Albrecht
Year: 1993 Elsevier eBooks Pages: 213-217 Publisher: Elsevier BV
Keywords:
Cobalt Silicide Materials science Metallurgy Silicon
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Topics
Semiconductor materials and interfaces
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Intermetallics and Advanced Alloy Properties
Physical Sciences → Engineering → Mechanical Engineering
Silicon and Solar Cell Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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