FABRICATION OF SUBMICRON SEMICONDUCTOR DEVICES BY HOLOGRAPHIC METHOD --- IV SUBMICRON GATE PROCESS

N. Nomura; Yuichi Hirofuji; T. EDAMATSU; and K. KUGIMIYA

doi:10.7567/ssdm.1983.c-3-4ln

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FABRICATION OF SUBMICRON SEMICONDUCTOR DEVICES BY HOLOGRAPHIC METHOD --- IV SUBMICRON GATE PROCESS

N. Nomura Yuichi Hirofuji T. EDAMATSU and K. KUGIMIYA

Year: 1983

DOI: 10.7567/ssdm.1983.c-3-4ln

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Keywords:

Materials science Fabrication Holography Semiconductor Optoelectronics Process (computing) Semiconductor device fabrication Nanotechnology Semiconductor device Optics Computer science

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

FABRICATION OF SUBMICRON SEMICONDUCTOR DEVICES BY HOLOGRAPHIC METHOD --- IV SUBMICRON GATE PROCESS

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